刘娅, 杨正兵, 蒋欣, 李磊, 何西良, 徐阳.用于磁控溅射膜的一种剥离技术[J].压电与声光,2018,40(3):331-333.LIU Ya, YANG Zhengbing, JIANG Xin, LI Lei, HE Xiliang, XU Yang.A Lift off Technique for Magnetron Sputtering Film[J].PIEZOELECTRICS AND ACOUSTOOPTICS
用于磁控溅射膜的一种剥离技术
A Lift off Technique for Magnetron Sputtering Film
  
DOI:10.11977/j.issn.1004-2474.2018.03.006
中文关键词:  磁控溅射  剥离工艺  双层胶  倒梯形  薄膜体声波谐振器(FBAR)
英文关键词:magnetron sputtering  lift off process  bi layer glue  T top  film bulk acoustic resonator(FBAR)
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作者单位
刘娅, 杨正兵, 蒋欣, 李磊, 何西良, 徐阳 (中国电子科技集团公司第二十六研究所重庆 400060) 
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中文摘要:
      为了解决磁控溅射膜的剥离问题,该文研制了一种新型的双层胶剥离技术。通过调整双层光刻胶的坚膜时间、坚膜温度和显影时间,制备出好的光刻胶倒梯形形貌,得到磁控溅射膜较好的剥离效果。为薄膜体声波谐振器(FBAR)的研制提供了有意义的指导。
英文摘要:
      In order to solve the problem of the lift off of magnetron sputtering film, a bi layer lift off process has been researched in this paper. The good lift off effect of magnetron sputtering film has been obtained through changing baking time, baking temperature and development time of the bi layer photoresist and the fine photoresist pattern with T top has been fabricated. The results provide a helpful process guideline for fabricating film bulk acoustic resonator (FBAR) devices.
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