In order to solve the problem of the liftoff of magnetron sputtering film, a bilayer liftoff process has been researched in this paper. The good liftoff effect of magnetron sputtering film has been obtained through changing baking time, baking temperature and development time of the bilayer photoresist and the fine photoresist pattern with Ttop has been fabricated. The results provide a helpful process guideline for fabricating film bulk acoustic resonator (FBAR) devices.
参考文献
相似文献
引证文献
引用本文
刘娅,杨正兵,蒋欣,李磊,何西良,徐阳.用于磁控溅射膜的一种剥离技术[J].压电与声光,2018,40(3):331-333. LIU Ya, YANG Zhengbing, JIANG Xin, LI Lei, HE Xiliang, XU Yang. A Liftoff Technique for Magnetron Sputtering Film[J]. PIEZOELECTRICS AND ACOUSTOOPTICS