The micronano structure Aldoped ZnO (AZO) thin films were deposited by the magnetron sputtering method and the binding winding bar scraping coating method on the glass substrate at room temperature,and the working pressure of the basement AZO film was adjusted from 1.5 Pa to 0.1 Pa.The structure, surface morphology,optical and electrical properties of the micronano structure AZO films were investigated by using Xray diffractometer (XRD),scanning electronic microscope (SEM),Hall effect test system,ultravioletvisible spectrophotometer and photoelectric fog meter as a function of different working pressure.The results indicated that the resistivity of the micronano structure AZO films was dominated by the working pressure of the basement AZO films.The films deposited under 0.2 Pa exhibited the lowest resistivity of 6.17×10-4 Ω·cm. The average optical transmittance was approximately 82.3% in the visible wavelength.With the decrease of working pressure, the surface morphology,growth form and the particle size of the films were changed greatly.The micronano structure AZO films with light trapping effect and excellent optical and electrical properties have been obtianed.