Nanoimprint lithography(NIL) is an excellent lithographic technique due to its high throughput and high resolution.But the adhesion during the demolding significantly limits the accurate transfer of patterns,thus how to overcome the anti-adhesion is very critical in NIL.The Fluorinated self-assembled monolayer(F-SAM) has been widely used as an effective anti-adhesion layer on the mold.Reviews and analysis are carried out about recent studies on the heat durability and degradation of F-SAMs.Meanwhile,other n...