用于SAW器件制造的键合减薄技术
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总装备部预研基金资助项目(62201070821);陕西省教育厅出国留学人员基金资助项目(608 000030);陕西省教育厅科研计划基金资助项目(12JK0686);西安工业大学校长基金资助项目(XAGDXJJ1002)

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Bonding and Thinning Technology for SAW Devices
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    摘要:

    铌酸锂(LiNbO3)作为一种压电材料,常被用于声表面波(SAW)器件的压电层,通常LiNbO3晶片厚度为500 μm,而实际上压电层的有效利用厚度为λ~2λ(λ为声表面波波长)。为能实现SAW器件的高度集成化,需用键合减薄及抛光技术对LiNbO3进行加工处理。用粒径100 nm的SiO2 抛光液对减薄后的铌酸锂晶体样品进行化学机械抛光,研究了抛光垫、抛光盘转速、压力及抛光时间对抛光过程的影响。抛光结果表明最佳抛光工艺参数是:采用阻尼布抛光盘,100 nm的SiO2 抛光液,转速为120 r/min,压力为3.9 N,抛光时间为40 min。经测试样品厚度为80 μm,样品的最小粗糙度Ra=0.468 nm,Rq=0.593 nm(Ra为算术平均粗糙度,Rq为均方根粗糙度)。

    Abstract:

    Piezoelectric material lithium niobate (LiNbO3) can be used as the piezoelectric layer in SAW devices,however the thickness of LiNbO3 crystal is usually 500 μm,actually the valid thickness varies from λ to 2λ. In order to realize the hybrid integration of SAW devices,LiNbO3 wafer need to be processed using the bonding and thinning technique.The sample of LiNbO3 crystal was chemical polished by using silicon dioxide solution of grain size 100 nm. The influence of polishing plate, polishing plate speed,pressure and polishing time on the polishing quality of LiNbO3 crystal were investigated. The optimum parameters were as follows. Polishing should be carried out using a polishing cloth and silicon dioxide solution of grain size 100 nm, a polishing plate speed of 120 r/min, a pressure of 3.9 N, and a polishing time of 40min. It was tested that thickness of the sample was 80 μm,optimal roughness Ra=0.468 nm and Rq=0.593 nm.

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程进,刘卫国,刘欢,郭伟进.用于SAW器件制造的键合减薄技术[J].压电与声光,2013,35(2):158-161. CHENG Jin, LIU Weiguo, LIU Huan, GUO Weijin. Bonding and Thinning Technology for SAW Devices[J]. PIEZOELECTRICS AND ACOUSTOOPTICS

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  • 在线发布日期: 2013-04-08
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