Mo layer was deposited on the Al2O3 ceramics by the direct current magnetron sputtering technique.Amorphous carbon thin film was then fabricated on the Mo layer by the microwave enhanced plasma chemical vapor deposition system.The structure and surface morphology were analyzed by XRD,Raman and SEM.The field emission and luminescence properties of the film were studied.Results indicated that the film had interesting field emission characters.The turn on field emission was 0.74 V/μm and the highest emission current density was obtained of 1.8 V/μm at 6 800 μA/cm2.The luminous points were uniformly distributed.The effective emission area and work function of the film were calculated by the iteration method.