薄膜体声波谐振器调频工艺研究
作者:
作者单位:

作者简介:

通讯作者:

基金项目:

伦理声明:



Study on Frequency Trimming of Film Bulk Acoustic Wave Resonator
Author:
Ethical statement:

Affiliation:

Funding:

  • 摘要
  • |
  • 图/表
  • |
  • 访问统计
  • |
  • 参考文献
  • |
  • 相似文献
  • |
  • 引证文献
  • |
  • 资源附件
    摘要:

    薄膜体声波器件具有体积小及性能高等优势,相关产品已被广泛应用于移动通信市场。薄膜体声波谐振器(FBAR)电极层和压电层等声学层的厚度、材料是影响谐振频率的主要因素。该文分析了FBAR调频的必要性、原理及扫描刻蚀的工作方式,研究了调频层薄膜在不同刻蚀功率时对器件频率的影响。通过对FBAR器件进行调频,频率均匀性提高了6.5倍,频率分散性得到显著改善。

    Abstract:

    The thin film bulk acoustic wave device has many advantages of small size and high performance, the related products have been widely used in the mobile communications market. The thickness and material of acoustic layer such as electrode and piezoelectric layers of the film bulk acoustic resonator(FBAR) are main influence factors of resonant frequency. The necessity and principle of frequency trimming for FBAR and the way of scanning etching are analyzed in this paper.The influence of trimming layer film on the freguency of the device at different etching power is studied. The frequency uniformity is increased by 6.5 times, and the frequency deviation is improved significantly by frequency trimming of FBAR.

    参考文献
    相似文献
    引证文献
引用本文

彭兴文,徐阳,杜波,张永川,司美菊,刘娅,何西良,卢丹丹.薄膜体声波谐振器调频工艺研究[J].压电与声光,2018,40(2):162-164. XU Yang, DU Bo, ZHANG Yongchuan, SI Meiju, LIU Ya, HE Xiliang, LU Dandan. Study on Frequency Trimming of Film Bulk Acoustic Wave Resonator[J]. PIEZOELECTRICS AND ACOUSTOOPTICS

复制
分享
文章指标
  • 点击次数:
  • 下载次数:
  • HTML阅读次数:
历史
  • 收稿日期:
  • 最后修改日期:
  • 录用日期:
  • 在线发布日期: 2018-04-16
  • 出版日期: